HFCVD 系统

Name: HFCVD 系统
Brand: ACME电力解决方案

产品描述

Product Summary: This equipment utilizes hot-filament chemical vapor deposition (CFDC) technology, primarily for growing diamond films, diamond-like carbon (DLC) films, silicon nitride films, and silicon oxide films. It is suitable for small-batch growth of large-size sheet-like polycrystalline diamond films, diamond film growth on tool surfaces, and nanodiamond films.

产品介绍

设备特点：

★ Stable lifting structure, good sample stage levelness, conducive to uniform film growth. The special structure of the filament frame ensures good parallelism of the hot filament, enabling long-term stable operation.

★ More rational gas path layout and more detailed considerations tailored to production processes ensure long-term stable operation.

★ Software configuration: Siemens PLC + 10-inch Siemens touch screen display, user-friendly interface, all operations can be completed on the touch screen.

★ Achieves uniform deposition within a substrate range of φ100-300mm.