DM300磁控溅射系统

This small-scale coating machine features a compact structure, a simple and elegant appearance, easy operation and maintenance, and low operating costs. The main unit and electrical control system are integrated into a single design. The main unit consists of a frame, a pump system, and a vacuum chamber. The coating process takes place within the sputtering vacuum chamber; the electrical control system uses a standard control cabinet containing modular modules, providing powerful functionality and stable performance.

The basic parameters of this ultra-high vacuum magnetron sputtering coating machine are as follows:

• Coating chamber ultimate vacuum: ≤6×10⁻⁵Pa;
• Evacuation time: Better than 6×10⁻⁴ Pa within 30 minutes;
• Vacuum chamber dimensions: 300×300×H350mm, the vacuum chamber is made of stainless steel;
• Target size and quantity: 2 φ50mm permanent magnet targets;
• Target-base distance is adjustable (40~100mm, adjusted via target position);
• Substrate rotation: adjustable from 0 to 60 rpm; equipped with heating, up to 500 degrees Celsius;
• Main unit dimensions: Approximately 1100mm (L) × 750mm (W) × 1650mm (H);
• Gas type: 2-channel MFC, working gas Ar + reactant gas;
• Film thickness measurement: Equipped with a quartz crystal film thickness gauge and original probe (optional);
• Control system: It adopts touch screen + PLC control, and the control includes pump, valve start and stop and output alarm functions;

System main configuration description