ACME-MW1070 Upgraded · 10kW · 2.45GHz

10kW MPCVD Machine – ACME-MW1070 Upgraded

2.45GHz MPCVD for lab-grown diamond, process development and production-oriented projects.

The ACME-MW1070 Upgraded is a 10kW microwave plasma chemical vapor deposition system designed around a water-cooled single-mode reaction chamber, approximately 90mm substrate stage, molecular-pump-based vacuum configuration, four-channel gas control, infrared temperature monitoring and integrated PLC/HMI control.

With 10kW rated microwave output and a typical coupled-power reference of approximately 9.3–9.7kW, the system is positioned for customers moving beyond small-scale experimental work into repeatable process development, pilot production and production expansion.

  • 10kW rated microwave output
  • 2.45GHz / 2450MHz microwave platform
  • Approx. Ø90mm substrate stage
  • Approx. Ø80mm usable process-area reference
  • 12–18kPa typical operating-pressure range
  • 4-channel MFC gas control
  • PLC/HMI + PC software + data recording
  • Project-specific FAT, installation and training support
Request a 10kW Technical Proposal

Send your substrate size, loading requirement, target application and site utilities. We will review the machine configuration and project scope before preparing the proposal.

10kW MPCVD machine ACME-MW1070 Upgraded with reaction chamber and HMI control
Model Selection

When Does a 10kW MPCVD System Make Sense?

A 10kW MPCVD system is typically evaluated when a project needs more process area, loading flexibility and production-development headroom than a compact laboratory platform, while still requiring a manageable equipment footprint and site utility requirement.

The power rating should not be selected in isolation. For an MPCVD project, the practical configuration also depends on substrate dimensions, desired loading arrangement, plasma usable area, vacuum architecture, gas control, cooling capacity and the process window that must be developed.

The ACME-MW1070 is therefore particularly relevant to projects such as:

Typical Project Profiles

Production Development and Expansion

  • Lab-grown diamond process development
  • Pilot or small-batch production
  • Production-line expansion
Research & Integration

Engineering and R&D Projects

  • Research programs requiring a larger working platform
  • Equipment OEM or system-integration projects requiring a defined 10kW MPCVD platform
For customers already working with a known seed size and batch target, the selection review can begin with the required stage arrangement rather than microwave power alone.
Current Technical Reference

10kW ACME-MW1070 Upgraded – Key Specifications

These values define the current ACME-MW1070 Upgraded reference. Final interfaces and supply configuration are confirmed in the technical proposal for the specific project.

Microwave frequency2.45GHz / 2450MHz
Rated microwave output10kW
Typical coupled-power referenceApprox. 9.3–9.7kW
Microwave sourceMagnetron
Reaction chamber Water-cooled stainless-steel cylindrical single-mode resonant chamber
Substrate stageApprox. Ø90mm
Usable process-area referenceApprox. Ø80mm
Typical operating pressure12–18kPa
Base vacuum reference0.1–0.5Pa
Vacuum configuration Molecular-pump-based configuration; final pump scope confirmed by project
Gas control4-channel MFC
Common process gasesH₂ / CH₄ / N₂ / O₂
Temperature measurement Monochromatic infrared measurement
Electrical input380V / 50Hz
Rated input capacity25kVA
Cooling-water reference30–36L/min
Cooling-water temperatureApprox. 25°C
Cooling-water pressure2–3.5bar
Water qualityDeionized water
Control PLC/HMI, PC software, remote functions and data recording
Equipment dimensions Approx. 1250 × 800 × 2100mm
Equipment weightApprox. 550kg
Stage & Loading

How Many Seeds Can a Typical 10kW Stage Hold?

The ACME-MW1070 uses an approximately 90mm substrate stage, with an approximately 80mm usable process-area reference.

For 7×7mm seeds, a practical project discussion can start from a typical arrangement of around 50 pieces.

This is not a guaranteed maximum capacity or a production-output specification.

Loading Factors

Actual Loading Should Be Reviewed According To

  • Seed dimensions
  • Edge clearance
  • Spacing between seeds
  • Fixture or holder arrangement
Process Factors

The Usable Arrangement Also Depends On

  • Required usable plasma region
  • Thermal distribution
  • Target process conditions
  • Final stage configuration
10kW MPCVD 90mm substrate stage with approximately 80mm usable area and typical 7x7mm seed loading
The ACME-MW1070 uses an approximately 90mm substrate stage with an approximately 80mm usable process-area reference. Typical 7×7mm loading depends on spacing and process conditions.

A larger theoretical geometric count does not automatically represent the preferred process arrangement.

For this reason, customers planning batch production should provide both the seed size and the expected number per run when requesting a proposal.

Integrated Engineering Platform

How the 10kW MPCVD System Works as an Integrated Platform

An MPCVD machine is not simply a microwave generator connected to a chamber. The operating platform depends on coordinated interaction between several subsystems.

10kW MPCVD integrated system architecture with microwave chamber vacuum gas cooling temperature monitoring and PLC control
The ACME-MW1070 coordinates microwave energy, reaction chamber, vacuum and pressure, gas delivery, cooling, temperature monitoring and PLC/HMI control as one process platform.

Microwave Platform

The 10kW / 2.45GHz microwave platform supplies the energy required to establish and maintain the plasma environment.

Reaction Chamber and Substrate Stage

The water-cooled single-mode resonant chamber provides the controlled process space around the substrate stage and plasma region.

Vacuum and Pressure Control

The vacuum architecture establishes the required chamber condition before and during operation.

For the current ACME-MW1070 reference, a molecular-pump-based configuration is used, while the final pump and auxiliary scope is defined by project.

Gas Delivery

Four MFC channels provide controlled gas delivery for commonly configured gases including H₂, CH₄, N₂ and O₂.

Temperature Monitoring

Monochromatic infrared measurement provides substrate-temperature monitoring without requiring publication of the underlying process recipe.

Cooling

Microwave generation, chamber operation and long process cycles place continuous thermal demand on the equipment. Cooling-water capacity therefore forms part of machine selection and site preparation.

PLC / HMI and Monitoring

The control system coordinates equipment status, monitoring, data recording and protection functions while providing the operator interface for the system.

The purpose of this integrated architecture is to give the project a defined equipment platform on which the required deposition or growth process can be developed.
Monitoring & Protection

Protection Is Designed Around the Major Operating Conditions of the System

The current 10kW platform incorporates protection and monitoring categories associated with the main machine subsystems.

These include monitoring related to:

Process and Thermal Conditions

  • Cooling-water condition
  • Chamber vacuum and pressure
  • Microwave reflected-power condition
  • Substrate over-temperature

Machine and Safety Conditions

  • Chamber and maintenance-door status
  • Gas-system condition
  • Electrical overload, overcurrent and high-voltage faults
  • Manual emergency stop
Protection parameters and control responses are configured as part of the machine control system and verified according to the agreed equipment and project requirements.

For project integration, the customer should identify any additional plant-level safety, interlock or facility requirements that need to be considered at the machine interface.

Site Utilities

What Utilities Are Required for a 10kW MPCVD Machine?

A 10kW MPCVD system requires more than floor space and an electrical connection. Electrical capacity, cooling water, process gases, exhaust and local safety infrastructure should be reviewed before equipment delivery.

10kW MPCVD site utility requirements for electrical power cooling water process gases exhaust ventilation and safety
Current ACME-MW1070 references include 380V/50Hz power, 25kVA input capacity and 30–36L/min deionized cooling water. Final interfaces are confirmed by project.
Electrical Power

Current ACME-MW1070 Reference

380V / 50Hz

Rated input-capacity reference: 25kVA.

Where the local facility voltage or frequency differs, the required adaptation should be reviewed before the final configuration is issued.

Cooling Water

Current Cooling-Water Reference

  • 30–36L/min
  • Approximately 25°C
  • 2–3.5bar
  • Deionized water

The available chiller capacity should be checked against both flow and temperature requirements.

Process Gases

Four-Channel MFC Architecture

The standard process-control architecture uses four MFC channels and is commonly configured around:

H₂ / CH₄ / N₂ / O₂

Gas purity, cylinder or bulk-gas arrangement, regulators and local safety provisions remain project- and site-dependent.

Exhaust & Facility Conditions

Installation Review Should Also Consider

  • Exhaust arrangement
  • Ventilation
  • Gas safety
  • Equipment access
  • Maintenance clearance
  • Applicable fire and building requirements
If your facility already has a chiller, gas-distribution system, exhaust system or voltage-adaptation equipment, provide the existing specifications during the project review. This helps determine which existing infrastructure can be retained and avoids duplicating equipment unnecessarily.
Supply Scope

What Is Included in a 10kW MPCVD Project?

The final supply scope is defined by the project rather than assuming that every auxiliary system is included in one fixed package.

10kW MPCVD supply scope showing core integrated machine project-configured items and site-side responsibilities
The 10kW MPCVD project scope separates the integrated machine platform, project-configured items and site-side responsibilities. Final responsibility and supply boundary are confirmed in the technical and commercial proposal.
Core Integrated Machine

Integrated MPCVD Platform

The 10kW MPCVD platform is built around the principal machine architecture, including:

  • Microwave system
  • Reaction / resonant chamber
  • Substrate stage
  • Core vacuum and pressure architecture
  • Gas-control architecture
  • PLC / HMI
  • Monitoring and protection
  • Integrated machine cabinet
Project-Configured / Optional

Defined According to Project Requirements

Depending on the project, the proposal may also define items such as:

  • Industrial chiller
  • Selected vacuum auxiliaries
  • Gas-supply hardware
  • Additional instrumentation
  • Voltage adaptation
  • Spare parts
  • Installation materials
  • Project-specific accessories
Site-Side Responsibilities

Common Customer-Side Requirements

Items commonly reviewed on the customer side include:

  • Electrical distribution
  • Local gas supply
  • Exhaust
  • Ventilation
  • Building works
  • Fire and safety infrastructure
  • Local approvals

If the customer already has compatible cooling, gas, exhaust or power infrastructure, those specifications should be submitted during technical review so that the project scope can be defined without unnecessary duplication.

The final responsibility and supply boundary are confirmed in the technical and commercial proposal.
Application Fit

Where Is the 10kW ACME-MW1070 Typically Used?

The 10kW ACME-MW1070 is primarily positioned for customers that need a practical bridge between process development and production-oriented operation.

Lab-Grown Diamond Production Development

Projects moving from experimental growth toward repeatable batch operation can evaluate the 10kW platform around seed size, stage arrangement and process requirements.

Pilot and Expansion Projects

Existing diamond-growth operators can use the 10kW model as a defined platform when adding capacity or developing another production line.

Research and Process Development

Universities, laboratories and advanced-material teams may evaluate the system when their work requires a larger working area and longer process capability than a smaller laboratory platform.

Equipment OEM and Integration

The ACME-MW1070 can also be reviewed as part of an equipment-integration project where the customer needs a defined MPCVD machine platform together with project-specific auxiliary interfaces.

The final application review should start from the material objective, substrate dimensions, loading target and facility conditions.
Project Evidence

10kW MPCVD Project Evidence – Thailand

A confirmed 2025 project in Thailand used an ACME-MW1070 10kW MPCVD system for artificial-diamond growth.

Country Thailand
Year 2025
Customer Type Synthetic-diamond equipment producer
Machine ACME-MW1070
Power 10kW
Application Artificial-diamond growth
Seed References 7×7mm and 10×10mm
Supply Scope Complete 10kW equipment package plus installation
Project Status Sold, delivered and operating
Project Role

Commercial and Production Cooperation

For this project, SDACME served as the commercial interface, while the cooperating production partner handled equipment manufacturing.

What This Project Demonstrates

For a customer evaluating a similar 10kW project, the machine itself is only one part of project definition. Seed dimensions, utilities, auxiliary systems, installation conditions and the required supply boundary should be reviewed before the final proposal is issued.

Project Support

FAT, Installation, Commissioning and Training

A 10kW MPCVD procurement normally includes technical coordination before shipment and support during project implementation.

FAT

Factory Acceptance

Depending on the agreed project scope, factory acceptance activities may include:

  • Equipment testing
  • FAT documentation
  • Test records
  • Video witnessing
  • Customer factory witnessing where arranged
Implementation

Installation and Commissioning

Support can be provided through combinations of:

  • Installation documentation
  • Remote assistance
  • On-site support
  • Equipment commissioning
  • Project-specific overseas service
Training

Operation, Maintenance and Process Guidance

Training can cover relevant areas such as:

  • Machine operation
  • Routine maintenance
  • Process-operation guidance
Process support is intended to help the customer operate and develop the equipment. It does not constitute a guarantee of final diamond yield, color, clarity or commercial result.

Warranty and After-Sales Support

The current commercial policy provides a 12-month warranty from acceptance, subject to the final contract and agreed exclusions. Remote after-sales support is available, while overseas on-site service is arranged according to the project.

FAQ

10kW MPCVD FAQ

Is a 10kW MPCVD machine suitable for production development?

Yes, it can be evaluated for production-development, pilot and expansion projects. The suitability depends on the required seed size, loading arrangement, target process and available facility utilities rather than microwave power alone.

For the ACME-MW1070, the approximately 90mm stage and approximately 80mm usable process-area reference provide a practical starting point for this project class.

How many 7×7mm seeds can a typical 10kW MPCVD stage hold?

A practical reference is around 50 pieces of 7×7mm seeds in a typical arrangement.

This should not be interpreted as a guaranteed maximum. Final loading depends on spacing, fixture arrangement, thermal conditions, usable plasma region and the selected process.

What utilities are required for a 10kW MPCVD machine?

Current ACME-MW1070 references include 380V/50Hz electrical input, 25kVA rated input capacity and 30–36L/min deionized cooling water at approximately 25°C and 2–3.5bar.

The project also requires review of process gases, exhaust, ventilation and site safety conditions.

What gases does the ACME-MW1070 use?

The current four-channel MFC configuration commonly supports:

H₂, CH₄, N₂ and O₂.

The required gas purity, delivery hardware and actual process use depend on the project and process requirements.

What is included with the 10kW MPCVD machine?

The project starts with the integrated MPCVD machine platform. Chillers, selected vacuum auxiliaries, gas-supply hardware, voltage adaptation, spare parts and installation materials may be configured according to project requirements.

Final supply responsibility is defined in the technical and commercial proposal.

Does a 10kW MPCVD machine guarantee a specific diamond output or growth result?

No.

The equipment is supplied against defined technical specifications, but final growth results depend on the process, seed condition, gas purity, operating practice, facility conditions and other variables.

What FAT and support are available?

Project support can include FAT documentation, video or factory witnessing, installation assistance, commissioning, training and remote after-sales support.

The exact support scope is defined in the project proposal and contract.

Technical Proposal

What Information Should You Send for a 10kW Proposal?

Start with the project requirement, not just the machine price.

To evaluate whether the ACME-MW1070 is appropriate, send:

  • Target application
  • Material to be grown or deposited
  • Seed or substrate dimensions
  • Expected number of substrates per run
  • Current project stage
  • Existing MPCVD experience, if applicable
  • Available electrical supply
  • Cooling-water or chiller conditions
  • Available process gases
  • Exhaust and ventilation conditions
  • Installation country
  • Required supply scope
  • Expected project schedule

If your site already has a chiller, gas system, exhaust infrastructure or power-conditioning equipment, include the main specifications.

This allows the proposal to distinguish between the equipment that must be supplied and the infrastructure that can remain on the customer side.