DM700 Magnetron sputtering system

DM-700 drum magnetron sputtering coating machine

Product Overview

Magnetron sputtering is a process of sputtering a thin film on a substrate. Principle: Inert process gas generates glow discharge to generate charged ions, which are accelerated by an electric field and bombard the surface of a solid target, causing atoms and molecules on the target surface to splash out, while generating secondary electrons, which collide with gas atoms again to form more charged ions. The particles sputtered from the target move toward the silicon wafer in a low-pressure atmosphere, collide with the substrate and are adsorbed by the substrate, and finally condense on the substrate to form the required thin film.

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The multifunctional magnetron sputtering coating system consists of a vacuum chamber ( 700mm in diameter and 850mm in height ) , a cylindrical rotating workpiece ( 500mm in diameter and 620mm in height, which can hold about 100 1*12inch samples at a time ) , a planar magnetron sputtering source system, a vacuum pumping and measuring system, a heating and temperature control system, a gas supply system, a circulating cooling system, and an electrical control system. It can prepare metal and non-metallic film layers. The system is equipped with three sets of 80*750 magnetron sputtering sources for preparing metal coatings . The vacuum pumping system adopts a high vacuum pumping system consisting of a molecular pump + Roots pump + mechanical pump + high vacuum electric valve .

Hardware configuration brand involved in the equipment