DM700 PVD Coating System

We are a professional manufacturer of electron beam evaporation coating systems, providing factory-direct 10kW high vacuum solutions for carbon thin film deposition with OEM customization for research and industrial applications.

Product Description

The main configuration parameters are as follows:

(1) Electron gun power: 10 KW;

(2) Beam current: 0 ~ 1000 mA adjustable;

(3) Ultimate vacuum: ≤ 5.0 × 10⁻⁵ Pa;

(4) Electron beam position adjustment width: ±20mm;

(5) Electron beam scanning width: ±20mm;

(6) Electron beam deflection angle: 270°;

(7) Electron beam scanning frequency: X=50Hz, Y=500Hz;

(8) Plate holder size: ≥6 inches;

(9) Number of sheets coated in a single application: ≥4 sheets;

(10) Cooling temperature of the substrate tray: ≤30℃. The substrate tray can be cooled during the coating process.

(11) Intra-film uniformity ≤2%, inter-film uniformity ≤3%;

(12) Possesses plasma cleaning function

(13) Coating material type: carbon-based material (must meet the requirements for carbon material thin film preparation).

This system is a single vacuum chamber configuration, with chamber dimensions of 700×700×800mm³ (adjustable according to design requirements). The chamber is made of 304 stainless steel, with a polished inner surface and shot-peened outer surface. For ease of operation, a side-opening door is used, with the evacuation port located at the rear. The door is equipped with a glass observation window (including a contamination-proof baffle). Considering the need for equipment cleaning and maintenance, the vacuum chamber cover can be opened, and the coating process is completed within this chamber. Flange interfaces are also provided for future system expansion.

The electron gun and evaporation electrodes are mounted on a vacuum base plate. The electron gun is an 8KW, six-station water-cooled crucible E-type electron gun.

The substrate holder is equipped with a water-cooling plate, and the sample holder adopts a sampling structure, which can hold up to 6 samples (4 pieces). The steaming distance is adjustable from 450 to 550 mm and can be manually adjusted. The substrate rotation speed is 3-60 rpm, which is controllable and adjustable (stepper motor controlled).

2.2 Vacuum generation principle

The vacuum generation system employs a molecular pump + mechanical pump unit: a turbomolecular pump is used as the main pump, and a mechanical rotary vane pump is used for pre-evacuation and as a backing pump to evacuate the vacuum chamber.

Vacuum control is achieved through a gate valve connected to the main pump; all valves are ultra-high vacuum valves with metal seals; air intake is controlled by a single mass flow meter. Piping and connections…

The inlet is made of precision stainless steel tubing and pressed corrugated tubing.

sedimentation system

 

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