DM300 Thin Film Preparation System

Product Description

DM300 Thin Film Preparation System

Main technical parameters:

  • Vacuum chamber: 300*300*H450mm;
  • Maximum plated workpiece diameter: φ100 mm, equipped with a pull-out sample stage, the sample can be rotated; a copper substrate sample stage is also provided.
  • Ultimate vacuum: Better than 6*10-5 Pa;
  • Evacuation time: At atmospheric pressure ~6*10-4 Pa, less than 30 min;
  • Evaporation: Resistance evaporation electrodes (4 pairs) Power: 2KW; Equipped with 2 sets of digital display evaporation power supplies, one of which can be switched to 2 sets of electrodes.
  • Opening method: Front opening structure, which facilitates wire replacement and material loading;
  • Vacuum system: mechanical pump + molecular pump;
  • Film thickness gauge: Quartz crystal film thickness gauge, equipped with a water-cooled probe;
  • Water cooling system: The system is equipped with a cooling water circulation system.

System main configuration description

 

projectSpecifications and Instructions
Vacuum chamberEvaporation vacuum chamber300*300*H450mm, dimensions may be adjusted according to design requirements, side-opening door.
molecular pump620L/S molecular pump
mechanical pumpThe BSV30 rotary vane pump functions as both a pre-pump and a backing pump.
baffle valveDN40 electromagnetic baffle valve, pre-extraction pipeline on/off
gate valve6mm double ferrule interface electric shut-off valve
Lighting and baking equipmentOptional
Various types of flanges and observation windowsDN16, 35, 63, 100, 150
Stainless steel pipes and fittingsPrecision stainless steel pipes, corrugated pipes, and pipe fittings of various specifications
Vacuum measurement and air intakeDigital display composite vacuum gauge5227 composite vacuum gauge or imported full-range gauge tube are optional.
Bare metal gaugeZJ52T, ZJ27 metal interface
Piping and fittingsMixing chamber
gate valve6mm double ferrule interface, electric shut-off valve
Intake and other control interfacesManual or electric control
Sample rackRotating substrate holderSubstrate rotation, substrate holder lifting
Lifting deviceLifting can be adjusted manually or electrically.
Substrate heating device≤600℃ heating device optional
Temperature control power supplyShimaden temperature controller from Japan, PID temperature control optional.
Evaporation Coating SystemEvaporation sourceWater-cooled evaporation source, 3-4 sets are optional
Evaporation power supply8-200A, 2-4 sets
Film thickness gaugeQuartz crystal film thickness gauge, optional film thickness controller, automatic coating
Equipment rackIntegrated layout
Water-gas systemIncluding cooling water machine
control systemStandard manual control, optional touchscreen automatic control

 

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